Surface morphology of r.f. sputtered bismuth titanate thin films

P. K. Ghosh, A. S. Bhalla, L. E. Cross

Research output: Contribution to journalArticlepeer-review

6 Scopus citations


Bismuth titanate (Bi4Ti3O12) thin films were prepared by the r.f. sputtering technique. A bismuth-rich target was used to compensate for the loss of bismuth during deposition. Studies on many films, deposited under various conditions, showed that existence of non-uniform erosion leads to many surface morphological features. This varying surface structure is a consequence of the resputtering process. Because the microstructure has a significant effect on the films electrical/optical response, a knowledge of its dependency on process parameters is an important step towards device development.

Original languageEnglish (US)
Pages (from-to)4659-4662
Number of pages4
JournalJournal of Materials Science
Issue number17
StatePublished - Jan 1994
Externally publishedYes

ASJC Scopus subject areas

  • Mechanics of Materials
  • Ceramics and Composites
  • Mechanical Engineering
  • Polymers and Plastics
  • General Materials Science
  • Materials Science (miscellaneous)


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