Surface morphology of r.f. sputtered bismuth titanate thin films

P. K. Ghosh, A. S. Bhalla, L. E. Cross

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

Bismuth titanate (Bi4Ti3O12) thin films were prepared by the r.f. sputtering technique. A bismuth-rich target was used to compensate for the loss of bismuth during deposition. Studies on many films, deposited under various conditions, showed that existence of non-uniform erosion leads to many surface morphological features. This varying surface structure is a consequence of the resputtering process. Because the microstructure has a significant effect on the films electrical/optical response, a knowledge of its dependency on process parameters is an important step towards device development.

Original languageEnglish (US)
Pages (from-to)4659-4662
Number of pages4
JournalJournal of Materials Science
Volume29
Issue number17
DOIs
StatePublished - Jan 1 1994

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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