Rational design of silsesquioxane-based polymers

Timothy S. Haddad, Joseph Schwab, Patrick T. Mather, Angel Romo-Uribe, Yoshiko Otonari, Michael J. Carr, Joseph D. Lichtenhan

Research output: Contribution to conferencePaper

1 Scopus citations

Abstract

Silsesquioxane-based polymers are a technologically important class of materials that is continuing to undergo rapid development. The recent synthesis of monomeric reagents based on polyhedral oligomeric silsesquioxanes (POSS) now enables the synthesis of silsesquioxane-based polymers via non sol-gel routes. POSS reagents containing only one or two reactive functionalities enable the preparation of silsesquioxane polymers with well-defined linear polymeric chains. The preparation of linear POSS-based copolymers with bead, pendant, and triblock architectures will be described. The synthesis, characterization, and properties for a family of POSS-siloxane copolymers will be presented in detail. These materials possess high thermal stabilities, indefinite shelf life, and mechanical properties which range from brittle to flexible plastics. Insights into extension of this approach to other POSS-copolymer compositions will also be discussed.

Original languageEnglish (US)
Pages1814-1816
Number of pages3
StatePublished - Jan 1 1997
EventProceedings of the 1997 55th Annual Technical Conference, ANTEC. Part 3 (of 3) - Toronto, Can
Duration: Apr 27 1997May 2 1997

Other

OtherProceedings of the 1997 55th Annual Technical Conference, ANTEC. Part 3 (of 3)
CityToronto, Can
Period4/27/975/2/97

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Polymers and Plastics

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    Haddad, T. S., Schwab, J., Mather, P. T., Romo-Uribe, A., Otonari, Y., Carr, M. J., & Lichtenhan, J. D. (1997). Rational design of silsesquioxane-based polymers. 1814-1816. Paper presented at Proceedings of the 1997 55th Annual Technical Conference, ANTEC. Part 3 (of 3), Toronto, Can, .