Photoassisted deposition of conducting palladium films

Yoon Git Kirnt, S. Bialyt, G. T. Stauft, R. W. Millert, J. T. Spencert, P. A. Dowbent, Saswati Dattat

Research output: Contribution to journalArticle

10 Scopus citations

Abstract

We have selectively deposited palladium on a wide variety of substrates including Kapton (polyimide resin), Ultem 1000 (polyetherimide resin). Teflon, silicon and silicon oxide. The palladium films were fabricated by ultraviolet photolytic decomposition of allylcyclopentadienyl palladium. The photolytic dissociation of this organometallic complex results in the formation of gaseous allyl (C3H5) and cyclopentadienyl (CBH5) species. These films are all conducting, but studies of the bulk resistivities suggest that thin films deposited on the polyimide resins are porous, and the resistivities deviate from the value expected for bulk palladium.

Original languageEnglish (US)
Pages (from-to)42-45
Number of pages4
JournalJournal of Micromechanics and Microengineering
Volume1
Issue number1
DOIs
StatePublished - Mar 1991

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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    Kirnt, Y. G., Bialyt, S., Stauft, G. T., Millert, R. W., Spencert, J. T., Dowbent, P. A., & Dattat, S. (1991). Photoassisted deposition of conducting palladium films. Journal of Micromechanics and Microengineering, 1(1), 42-45. https://doi.org/10.1088/0960-1317/1/1/008