Method of Producing an Ultra Thin Electrically Conducting Film with Very Low Electrical Resistance

Klaus Schroder (Inventor)

Research output: Patent

Abstract

An ultra thin film with very low electrical resistance is produced by forming a substrate of a substrate material which forms a metastable bond and depositing a conducting film on the substrate in a vacuum environment in which a base pressure is reduced to a value below 10−5 Torr. The film is a metal, metallic alloy, or multilayered film which includes at least one metallic layer. A 0.1 nm thick manganese film deposited in this way on a germanium substrate has a resistivity which at room temperature is lower than the resistivity of metal films of aluminum and copper with the same thickness prepared the same way.
Original languageEnglish (US)
Patent number7,468,557
StatePublished - Jun 3 2004

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