@inproceedings{5e34511e50294503bf18a73aebb5bad5,
title = "Laser-induced selective copper deposition on polyimides and semiconductors",
abstract = "It has been demonstrated that copper can be selectively deposited on a variety of substrates including Teflon (polytetrafluoroethylene or PTFE), Kapton (polyimide resin), silicon and gallium arsenide from solution by photo-assisted initiated deposition. A copper containing solution was prepared from a mixture of copper(I) chloride (Cu2Cl2) and decaborane (B10H14) in diethyl ether and/or THF (tetrahydrofuran). The copper films were fabricated by ultraviolet photolytic decomposition of copper chloride and polyhedral borane clusters. This liquid phase deposition has a gas-phase cluster analog that also results in copper deposition via pyrolysis. The approach of depositing metal thin films selectively by pholysis from solution is a novel and an underutilized approach to selective area deposition.",
author = "Hwang, {Seong Don} and Kher, {S. S.} and Spencer, {J. T.} and Dowben, {P. A.}",
year = "1993",
language = "English (US)",
isbn = "1558991778",
series = "Materials Research Society Symposium Proceedings",
publisher = "Publ by Materials Research Society",
pages = "185--189",
booktitle = "Chemical Perspectives of Microelectronic Materials III",
note = "Proceedings of the 3rd Biennial Meeting of Chemical Perspectives of Microelectronic Materials ; Conference date: 30-11-1992 Through 03-12-1992",
}