Abstract
We review the current understanding of growth of metals on metal films prepared in far-from-equilibrium conditions. Recent experimental and computational studies of metal-on-metal growth are presented and physical/chemical factors controlling this type of growth are identified and discussed. The technique of atom beam scattering to probe thin film growth in situ and in real time is illustrated in detail with selected results of a study of metal-on-metal heteroepitaxial growth.
Original language | English (US) |
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Pages (from-to) | 709-719 |
Number of pages | 11 |
Journal | Surface Review and Letters |
Volume | 4 |
Issue number | 4 |
DOIs | |
State | Published - Aug 1997 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry