Growth of high-aspect ratio horizontally-aligned ZnO nanowire arrays

Pranav Soman, Max Darnell, Marc D. Feldman, Shaochen Chen

Research output: Contribution to journalArticlepeer-review

12 Scopus citations


A method of fabricating horizontally-aligned zinc-oxide (ZnO) nanowire (NW) arrays with full control over the width and length is demonstrated. SEM images reveal the hexagonal structure typical of zinc oxide NWs. Arrays of high-aspect ratio horizontal ZnO NWs are fabricated by making use of the lateral overgrowth from dot patterns created by electron beam lithography (EBL). An array of patterned wires are lifted off and transferred to a flexible PDMS substrate with possible applications in several key nanotechnology areas.

Original languageEnglish (US)
Pages (from-to)6880-6885
Number of pages6
JournalJournal of Nanoscience and Nanotechnology
Issue number8
StatePublished - Aug 2011
Externally publishedYes


  • E-beam lithography
  • High-Aspect ratio
  • Horizontally-aligned
  • Nanowire
  • PDMS
  • Patterning
  • Zinc oxide

ASJC Scopus subject areas

  • Bioengineering
  • General Chemistry
  • Biomedical Engineering
  • General Materials Science
  • Condensed Matter Physics


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