Directly Photopatternable Polythiophene as Dual-Tone Photoresist

Xiaoran Hu; John A. Lawrence; James Mullahoo; Zachary C. Smith; Daniel J. Wilson; Charles R. Mace; Samuel W. Thomas

doi:10.1021/acs.macromol.7b01208

Directly Photopatternable Polythiophene as Dual-Tone Photoresist

Xiaoran Hu, John A. Lawrence, James Mullahoo, Zachary C. Smith, Daniel J. Wilson, Charles R. Mace, Samuel W. Thomas

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

We report a directly photopatternable polythiophene derivative PT_oNB with o-nitrobenzyl (oNB)-functionalized side chains. PT_oNB has unique phototunable solubilities programmed through three stages: (i) organic-soluble/aqueous-insoluble, (ii) organic-insoluble/aqueous-insoluble, and (iii) organic-insoluble/aqueous soluble. The capability to control conjugated polymer solubility with spatiotemporal precision and orthogonal developer solvents through three stages allows for direct patterning of this conjugated polymer and provides flexibility to choose between positive and negative tone photolithography. This approach to photomodulate solubility also enables all-solution processing of multilayer stacked conjugated polymer films; we demonstrate here direct two-layer photopatterning with this novel conjugated polymer photoresist.

Original language	English (US)
Pages (from-to)	7258-7267
Number of pages	10
Journal	Macromolecules
Volume	50
Issue number	18
DOIs	https://doi.org/10.1021/acs.macromol.7b01208
State	Published - Sep 26 2017
Externally published	Yes

ASJC Scopus subject areas

Organic Chemistry
Polymers and Plastics
Inorganic Chemistry
Materials Chemistry

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10.1021/acs.macromol.7b01208

Cite this

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title = "Directly Photopatternable Polythiophene as Dual-Tone Photoresist",

abstract = "We report a directly photopatternable polythiophene derivative PToNB with o-nitrobenzyl (oNB)-functionalized side chains. PToNB has unique phototunable solubilities programmed through three stages: (i) organic-soluble/aqueous-insoluble, (ii) organic-insoluble/aqueous-insoluble, and (iii) organic-insoluble/aqueous soluble. The capability to control conjugated polymer solubility with spatiotemporal precision and orthogonal developer solvents through three stages allows for direct patterning of this conjugated polymer and provides flexibility to choose between positive and negative tone photolithography. This approach to photomodulate solubility also enables all-solution processing of multilayer stacked conjugated polymer films; we demonstrate here direct two-layer photopatterning with this novel conjugated polymer photoresist.",

author = "Xiaoran Hu and Lawrence, {John A.} and James Mullahoo and Smith, {Zachary C.} and Wilson, {Daniel J.} and Mace, {Charles R.} and Thomas, {Samuel W.}",

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language = "English (US)",

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T1 - Directly Photopatternable Polythiophene as Dual-Tone Photoresist

AU - Hu, Xiaoran

AU - Lawrence, John A.

AU - Mullahoo, James

AU - Smith, Zachary C.

AU - Wilson, Daniel J.

AU - Mace, Charles R.

AU - Thomas, Samuel W.

PY - 2017/9/26

Y1 - 2017/9/26

N2 - We report a directly photopatternable polythiophene derivative PToNB with o-nitrobenzyl (oNB)-functionalized side chains. PToNB has unique phototunable solubilities programmed through three stages: (i) organic-soluble/aqueous-insoluble, (ii) organic-insoluble/aqueous-insoluble, and (iii) organic-insoluble/aqueous soluble. The capability to control conjugated polymer solubility with spatiotemporal precision and orthogonal developer solvents through three stages allows for direct patterning of this conjugated polymer and provides flexibility to choose between positive and negative tone photolithography. This approach to photomodulate solubility also enables all-solution processing of multilayer stacked conjugated polymer films; we demonstrate here direct two-layer photopatterning with this novel conjugated polymer photoresist.

AB - We report a directly photopatternable polythiophene derivative PToNB with o-nitrobenzyl (oNB)-functionalized side chains. PToNB has unique phototunable solubilities programmed through three stages: (i) organic-soluble/aqueous-insoluble, (ii) organic-insoluble/aqueous-insoluble, and (iii) organic-insoluble/aqueous soluble. The capability to control conjugated polymer solubility with spatiotemporal precision and orthogonal developer solvents through three stages allows for direct patterning of this conjugated polymer and provides flexibility to choose between positive and negative tone photolithography. This approach to photomodulate solubility also enables all-solution processing of multilayer stacked conjugated polymer films; we demonstrate here direct two-layer photopatterning with this novel conjugated polymer photoresist.

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Directly Photopatternable Polythiophene as Dual-Tone Photoresist

Abstract

ASJC Scopus subject areas

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