Directly Photopatternable Polythiophene as Dual-Tone Photoresist

Xiaoran Hu, John A. Lawrence, James Mullahoo, Zachary C. Smith, Daniel J. Wilson, Charles R. Mace, Samuel W. Thomas

Research output: Contribution to journalArticlepeer-review

10 Scopus citations


We report a directly photopatternable polythiophene derivative PToNB with o-nitrobenzyl (oNB)-functionalized side chains. PToNB has unique phototunable solubilities programmed through three stages: (i) organic-soluble/aqueous-insoluble, (ii) organic-insoluble/aqueous-insoluble, and (iii) organic-insoluble/aqueous soluble. The capability to control conjugated polymer solubility with spatiotemporal precision and orthogonal developer solvents through three stages allows for direct patterning of this conjugated polymer and provides flexibility to choose between positive and negative tone photolithography. This approach to photomodulate solubility also enables all-solution processing of multilayer stacked conjugated polymer films; we demonstrate here direct two-layer photopatterning with this novel conjugated polymer photoresist.

Original languageEnglish (US)
Pages (from-to)7258-7267
Number of pages10
Issue number18
StatePublished - Sep 26 2017
Externally publishedYes

ASJC Scopus subject areas

  • Organic Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry
  • Materials Chemistry


Dive into the research topics of 'Directly Photopatternable Polythiophene as Dual-Tone Photoresist'. Together they form a unique fingerprint.

Cite this