Deposition of thin metal and metal silicide films from the decomposition of organometallic compounds

Engineering & Materials Science

• Organometallics 96%
• Silicides 86%
• Vapor phase epitaxy 56%
• Decomposition 45%
• Thin films 45%
• Metals 40%
• Molecular beam epitaxy 24%
• Organic chemicals 24%
• Chemical vapor deposition 18%
• Plasmas 14%

Physics & Astronomy

• organometallic compounds 100%
• silicides 65%
• decomposition 48%
• vapor phase epitaxy 44%
• thin films 32%
• metals 32%
• molecular beam epitaxy 18%
• vapor deposition 16%

Chemical Compounds

• Organometallic Compound 73%
• Vapor Phase Epitaxy 66%
• Decomposition 40%
• Liquid Film 30%
• Molecular Beam Epitaxy 30%
• Metal 28%
• Film Material 28%
• Chemical Vapour Deposition 19%
• Metallocene 18%