Deposition of thin metal and metal silicide films from the decomposition of organometallic compounds

P. A. Dowben; J. T. Spencer; G. T. Stauf

doi:10.1016/0921-5107(89)90007-X

Deposition of thin metal and metal silicide films from the decomposition of organometallic compounds

P. A. Dowben, J. T. Spencer, G. T. Stauf

Department of Chemistry

Research output: Contribution to journal › Article › peer-review

41 Scopus citations

Abstract

The deposition of metal silicide thin films can be undertaken using volatile organometallic complexes. Organometallic vapor phase epitaxy or metal-organic chemical vapor phase epitaxy has a number of potential advantages over conventional chemical vapor deposition and molecular beam epitaxy technologies, and a number of novel thin film materials may be made from organometallic compounds. Plasma-, pyrolytic- and photolytic- assisted decomposition of organometallic complexes have been undertaken in an effort to make a variety of metallic and metal silicide thin films. These efforts are comprehensively reviewed.

Original language	English (US)
Pages (from-to)	297-323
Number of pages	27
Journal	Materials Science and Engineering B
Volume	2
Issue number	4
DOIs	https://doi.org/10.1016/0921-5107(89)90007-X
State	Published - Apr 1989

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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