TY - GEN
T1 - Computational modeling of laser-induced self-organization in nanoscopic metal films for predictive nanomanufacturing
AU - Trice, Justin
AU - Kalyanaraman, Ramki
AU - Sureshkumar, Radhakrishna
PY - 2007
Y1 - 2007
N2 - Computer models that accurately predict the dynamics of nanoscale self-organization are vital towards knowledge-based nanomanufacturing. Here we present a first principles computational model of laser induced self-organization of thin metallic films (thickness <= 30 nm) into nanoscale patterns which eventually evolve into ordered nanoparticles. The pattern formation is initiated by a thin film hydrodynamic instability and the ensuing length scales are related to the intrinsic materials properties such as surface tension and van der Waal's dispersion forces. We discuss a fully implicit, finite-difference method with adaptive time step and mesh size control for the solution of the nonlinear, fourth-order PDE governing the thin film dynamics. These simulations capture the changing morphology of the film due to the competition between surface tension and van der Waals forces. Simulation results are used to understand the nonlinear amplification of film height perturbations ∼ (KT/γ)1/2, where K, T and γ represent the Boltzmann constant, absolute temperature, and surface tension respectively, leading eventually to film rupture.
AB - Computer models that accurately predict the dynamics of nanoscale self-organization are vital towards knowledge-based nanomanufacturing. Here we present a first principles computational model of laser induced self-organization of thin metallic films (thickness <= 30 nm) into nanoscale patterns which eventually evolve into ordered nanoparticles. The pattern formation is initiated by a thin film hydrodynamic instability and the ensuing length scales are related to the intrinsic materials properties such as surface tension and van der Waal's dispersion forces. We discuss a fully implicit, finite-difference method with adaptive time step and mesh size control for the solution of the nonlinear, fourth-order PDE governing the thin film dynamics. These simulations capture the changing morphology of the film due to the competition between surface tension and van der Waals forces. Simulation results are used to understand the nonlinear amplification of film height perturbations ∼ (KT/γ)1/2, where K, T and γ represent the Boltzmann constant, absolute temperature, and surface tension respectively, leading eventually to film rupture.
KW - Finite-difference
KW - Lubrication equation
KW - Nanoparticles
KW - Process modeling
KW - Thin film
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UR - http://www.scopus.com/inward/citedby.url?scp=42149112444&partnerID=8YFLogxK
U2 - 10.1117/12.734510
DO - 10.1117/12.734510
M3 - Conference contribution
AN - SCOPUS:42149112444
SN - 9780819467966
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Instrumentation, Metrology, and Standards for Nanomanufacturing
T2 - Instrumentation, Metrology, and Standards for Nanomanufacturing
Y2 - 29 August 2007 through 30 August 2007
ER -