Chemical vapor deposition precursor chemistry. 5. The photolytic laser deposition of aluminum thin films by chemical vapor deposition

Physics & Astronomy

• laser deposition 100%
• chemistry 66%
• vapor deposition 59%
• photolysis 55%
• aluminum 52%
• ligands 51%
• dissociation 42%
• thin films 39%
• nitrogen 37%
• lasers 33%
• gas streams 32%
• teflon (trademark) 30%
• mass spectroscopy 24%
• fragmentation 23%
• purity 22%
• fragments 21%
• quadrupoles 21%
• gold 20%
• argon 20%
• orbitals 18%
• scanning electron microscopy 16%
• irradiation 16%
• spectroscopy 13%
• ions 11%
• x rays 11%
• interactions 10%

Engineering & Materials Science

• Photolysis 90%
• Chemical vapor deposition 89%
• Thin films 72%
• Ligands 68%
• Aluminum 59%
• Polytetrafluoroethylenes 58%
• Lasers 58%
• Nitrogen 47%
• Laser beam effects 38%
• X-Ray Emission Spectrometry 33%
• Mass spectrometry 32%
• Argon 28%
• Gold 27%
• Ions 23%
• Scanning electron microscopy 20%
• Substrates 18%
• Gases 14%

Chemical Compounds

• Trimethylamine 93%
• Chemical Vapour Deposition 69%
• Chemistry 45%
• Photolysis 27%
• X-Ray Emission Spectroscopy 22%
• Dissociation 22%
• MNDO Calculation 21%
• Quadrupole Mass Spectroscopy 19%
• Poly(tetrafluoroethylene) 16%
• Ligand 13%
• Fragmentation 12%
• Orbital 12%
• Nitrogen 9%
• Scanning Electron Microscopy 9%
• Gas 8%
• Purity 7%
• Ion 6%