Chemical Vapor Deposition Precursor Chemistry. 2. Formation of Pure Aluminum, Alumina, and Aluminum Boride thin Filmsfrom Boron-Containing Precursor Compounds by Chemical Vapor Deposition

John A. Glass, Shreyas S. Kher, James T. Spencer

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Fingerprint

Dive into the research topics of 'Chemical Vapor Deposition Precursor Chemistry. 2. Formation of Pure Aluminum, Alumina, and Aluminum Boride thin Filmsfrom Boron-Containing Precursor Compounds by Chemical Vapor Deposition'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds