@article{77538bc4aa4541dfacd87ff19bab877c,
title = "Chemical vapor deposition precursor chemistry 1: The deposition of pure aluminum thin films from an aluminaborane precursor compound by chemical vapor deposition",
author = "Glass, {John A.} and Shreyas Kher and Spencer, {James T.}",
note = "Funding Information: This work was funded by the National Science Foundation( Grant MSS-89-09793)t,h e GeneraEl lectric Company, the Wright-Patterson Laboratory (Award F33615-90-C-5291a)n, dthe IndustrialA ffiliatesP rogram of theC enterf or MolecularE lectronics fosru pporto f this work. We wish to thank Dr. StephenD . Herseea nd Mr. GeorgeO . Ramseyerfo r their valuablea ssistancdeu ring the courseo f this work.",
year = "1992",
month = jan,
day = "30",
doi = "10.1016/0040-6090(92)90093-Q",
language = "English (US)",
volume = "207",
pages = "15--18",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "1-2",
}