Chemical vapor deposition precursor chemistry 1: The deposition of pure aluminum thin films from an aluminaborane precursor compound by chemical vapor deposition

John A. Glass, Shreyas Kher, James T. Spencer

Research output: Contribution to journalArticle

10 Scopus citations
Original languageEnglish (US)
Pages (from-to)15-18
Number of pages4
JournalThin Solid Films
Volume207
Issue number1-2
DOIs
StatePublished - Jan 30 1992
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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