Chemical vapor deposition of metal borides: 6. the formation of neodymium boride thin film materials from polyhedral boron clusters and metal halides by chemical vapor deposition

Shreyas S. Kher, Jennifer V. Romero, John D. Caruso, James T. Spencer

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

The chemical vapor deposition (CVD) of crystalline thin films of neodymium hexaboride (NdB6) was achieved using either nido-pentaborane(9) or nido-decaborane(14) with neodymium(lll) chloride on different substrates. The highly crystalline NdB6 films were formed at relatively moderate temperatures (835° C, ca. 1 μm/h) and were characterized by scanning electron microscopy, X-ray emission spectroscopy, X-ray diffraction and glow discharge mass spectrometry. The NdB6 polycrystalline films were found to be pure and uniform in composition in the bulk material. Depositions using CoCl2, NdCl3 and B5H9 as the CVD precursors resulted in the formation of a mixture of NdB6 and CoB phases, rather than the ternary phase.

Original languageEnglish (US)
Pages (from-to)300-307
Number of pages8
JournalApplied Organometallic Chemistry
Volume22
Issue number6
DOIs
StatePublished - Jun 1 2008

Keywords

  • Chemical vapor deposition
  • Cobalt boride
  • Metal boride
  • Neodymium boride

ASJC Scopus subject areas

  • Chemistry(all)
  • Inorganic Chemistry

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