Abstract
The chemical vapor deposition (CVD) of crystalline thin films of neodymium hexaboride (NdB6) was achieved using either nido-pentaborane(9) or nido-decaborane(14) with neodymium(lll) chloride on different substrates. The highly crystalline NdB6 films were formed at relatively moderate temperatures (835° C, ca. 1 μm/h) and were characterized by scanning electron microscopy, X-ray emission spectroscopy, X-ray diffraction and glow discharge mass spectrometry. The NdB6 polycrystalline films were found to be pure and uniform in composition in the bulk material. Depositions using CoCl2, NdCl3 and B5H9 as the CVD precursors resulted in the formation of a mixture of NdB6 and CoB phases, rather than the ternary phase.
Original language | English (US) |
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Pages (from-to) | 300-307 |
Number of pages | 8 |
Journal | Applied Organometallic Chemistry |
Volume | 22 |
Issue number | 6 |
DOIs | |
State | Published - Jun 2008 |
Keywords
- Chemical vapor deposition
- Cobalt boride
- Metal boride
- Neodymium boride
ASJC Scopus subject areas
- General Chemistry
- Inorganic Chemistry