Chemical vapor deposition of boron and boron nitride from decaborane(14)

Yoon Gi Kim; P. A. Dowben; J. T. Spencer; G. O. Ramseyer

doi:10.1116/1.576181

Chemical vapor deposition of boron and boron nitride from decaborane(14)

Yoon Gi Kim, P. A. Dowben, J. T. Spencer, G. O. Ramseyer

Department of Chemistry

Research output: Contribution to journal › Comment/Debate/Erratum › peer-review

27 Scopus citations

Abstract

We have investigated photoassisted, plasma enhanced chemical vapor deposition and pyrolytic deposition of boron from decaborane (B₁₀H₁₄) and boron nitride from decaborane combined with nitrogen or ammonia. The use of decaborane for depositing boron and boron nitride thin films is seen as a viable alternative to diborane or boron halides.

Original language	English (US)
Pages (from-to)	2796-2799
Number of pages	4
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	7
Issue number	4
DOIs	https://doi.org/10.1116/1.576181
State	Published - Jul 1989

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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@article{cc38b3e6427e4d15b44454123b7a8851,

title = "Chemical vapor deposition of boron and boron nitride from decaborane(14)",

abstract = "We have investigated photoassisted, plasma enhanced chemical vapor deposition and pyrolytic deposition of boron from decaborane (B10H14) and boron nitride from decaborane combined with nitrogen or ammonia. The use of decaborane for depositing boron and boron nitride thin films is seen as a viable alternative to diborane or boron halides.",

author = "Kim, {Yoon Gi} and Dowben, {P. A.} and Spencer, {J. T.} and Ramseyer, {G. O.}",

year = "1989",

month = jul,

doi = "10.1116/1.576181",

language = "English (US)",

volume = "7",

pages = "2796--2799",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "4",

}

TY - JOUR

T1 - Chemical vapor deposition of boron and boron nitride from decaborane(14)

AU - Kim, Yoon Gi

AU - Dowben, P. A.

AU - Spencer, J. T.

AU - Ramseyer, G. O.

PY - 1989/7

Y1 - 1989/7

N2 - We have investigated photoassisted, plasma enhanced chemical vapor deposition and pyrolytic deposition of boron from decaborane (B10H14) and boron nitride from decaborane combined with nitrogen or ammonia. The use of decaborane for depositing boron and boron nitride thin films is seen as a viable alternative to diborane or boron halides.

AB - We have investigated photoassisted, plasma enhanced chemical vapor deposition and pyrolytic deposition of boron from decaborane (B10H14) and boron nitride from decaborane combined with nitrogen or ammonia. The use of decaborane for depositing boron and boron nitride thin films is seen as a viable alternative to diborane or boron halides.

UR - http://www.scopus.com/inward/record.url?scp=0013031967&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0013031967&partnerID=8YFLogxK

U2 - 10.1116/1.576181

DO - 10.1116/1.576181

M3 - Comment/Debate/Erratum

AN - SCOPUS:0013031967

SN - 0734-2101

VL - 7

SP - 2796

EP - 2799

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 4

ER -

Chemical vapor deposition of boron and boron nitride from decaborane(14)

Abstract

ASJC Scopus subject areas

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