Chemical vapor deposition of boron and boron nitride from decaborane(14)

Yoon Gi Kim, P. A. Dowben, J. T. Spencer, G. O. Ramseyer

Research output: Contribution to journalComment/Debate/Erratumpeer-review

27 Scopus citations


We have investigated photoassisted, plasma enhanced chemical vapor deposition and pyrolytic deposition of boron from decaborane (B10H14) and boron nitride from decaborane combined with nitrogen or ammonia. The use of decaborane for depositing boron and boron nitride thin films is seen as a viable alternative to diborane or boron halides.

Original languageEnglish (US)
Pages (from-to)2796-2799
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number4
StatePublished - Jul 1989

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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