Abstract
Closo-l,2-dicarbadodecaborane (C2B10H12, otherwise known as orthocarborane) adsorption and bonding on Cu(100) were investigated over the substrate temperature range 150 to 400 K using atomic beam scattering (ABS), photoemission and Auger electron spectroscopy. At 150-180 K, orthocarborane adsorbed molecularly with one or two carbon atoms forming bonds with the copper surface in the monolayer coverage range. The molecular orientation within the film becomes more disoriented as coverage is increased above 1 monolayer. For adsorption at 250 K or higher, there is clear evidence that orthocarborane dissociatively adsorbs on the Cu(100) surface. The photoemission features attributable to the orthocarborane molecular orbitals have been compared with gas phase measurements and theory.
Original language | English (US) |
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Pages (from-to) | 239-250 |
Number of pages | 12 |
Journal | Surface Science |
Volume | 313 |
Issue number | 3 |
DOIs | |
State | Published - Jul 1 1994 |
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ASJC Scopus subject areas
- Physical and Theoretical Chemistry
- Condensed Matter Physics
- Surfaces and Interfaces
Cite this
Adsorption and bonding of molecular icosahedra on Cu(100). / Zeng, Hong; Byun, Dongjin; Zhang, Jiandi; Vidali, Gianfranco; Onellion, M.; Dowben, P. A.
In: Surface Science, Vol. 313, No. 3, 01.07.1994, p. 239-250.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Adsorption and bonding of molecular icosahedra on Cu(100)
AU - Zeng, Hong
AU - Byun, Dongjin
AU - Zhang, Jiandi
AU - Vidali, Gianfranco
AU - Onellion, M.
AU - Dowben, P. A.
PY - 1994/7/1
Y1 - 1994/7/1
N2 - Closo-l,2-dicarbadodecaborane (C2B10H12, otherwise known as orthocarborane) adsorption and bonding on Cu(100) were investigated over the substrate temperature range 150 to 400 K using atomic beam scattering (ABS), photoemission and Auger electron spectroscopy. At 150-180 K, orthocarborane adsorbed molecularly with one or two carbon atoms forming bonds with the copper surface in the monolayer coverage range. The molecular orientation within the film becomes more disoriented as coverage is increased above 1 monolayer. For adsorption at 250 K or higher, there is clear evidence that orthocarborane dissociatively adsorbs on the Cu(100) surface. The photoemission features attributable to the orthocarborane molecular orbitals have been compared with gas phase measurements and theory.
AB - Closo-l,2-dicarbadodecaborane (C2B10H12, otherwise known as orthocarborane) adsorption and bonding on Cu(100) were investigated over the substrate temperature range 150 to 400 K using atomic beam scattering (ABS), photoemission and Auger electron spectroscopy. At 150-180 K, orthocarborane adsorbed molecularly with one or two carbon atoms forming bonds with the copper surface in the monolayer coverage range. The molecular orientation within the film becomes more disoriented as coverage is increased above 1 monolayer. For adsorption at 250 K or higher, there is clear evidence that orthocarborane dissociatively adsorbs on the Cu(100) surface. The photoemission features attributable to the orthocarborane molecular orbitals have been compared with gas phase measurements and theory.
UR - http://www.scopus.com/inward/record.url?scp=0028464772&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0028464772&partnerID=8YFLogxK
U2 - 10.1016/0039-6028(94)90045-0
DO - 10.1016/0039-6028(94)90045-0
M3 - Article
AN - SCOPUS:0028464772
VL - 313
SP - 239
EP - 250
JO - Surface Science
JF - Surface Science
SN - 0039-6028
IS - 3
ER -